| ‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘ KAWASAKI STEEL TECHNICAL REPORT No.30 ( August 1994 ) Special Issue on LSI ‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘‘ |
| High Quality Dielectric Film for 0.35-Κm Design Rule Application by O3-TEOS-CVD Using Ethanol Pre-treatment Nobuyoshi Sato, Tadashi Nakano, Tomohiro Ohta |
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Synopsis : A new surface treatment involving the spin-coating of ethanol on a substrate prior to O3-tetraethylorthosilicate (TEOS) deposition by atmospheric pressure chemical vapor deposition (APCVD) was found to be very effective of improving the gap-filling properties and film quality. The deposited film has a flow-like surface shape, and can be used to fill trenches of 0.3Κm width and 1.2Κm depth, which could not be filled by conventional O3-TEOS APCVD. The effects of surface treating by some other organic solvents are also reported and a possible mechanism is presented. |
| TextiPDF: 6p./277kbj |